The modeling of realistic chemical vapor infiltration/deposition reactors (Q4933233)
From MaRDI portal
 | This is the item page for this Wikibase entity, intended for internal use and editing purposes. Please use this page instead for the normal view: The modeling of realistic chemical vapor infiltration/deposition reactors |
scientific article; zbMATH DE number 5798798
| Language | Label | Description | Also known as |
|---|---|---|---|
| default for all languages | No label defined |
||
| English | The modeling of realistic chemical vapor infiltration/deposition reactors |
scientific article; zbMATH DE number 5798798 |
Statements
The modeling of realistic chemical vapor infiltration/deposition reactors (English)
0 references
12 October 2010
0 references
chemical vapor deposition/infiltration
0 references
carbon deposition
0 references
reactive flow in porous media
0 references
low Mach number flow
0 references
fractional step method
0 references
Strang splitting operator
0 references
0 references
0 references
0 references
0 references
0 references
0 references
0 references
0 references
0 references
0 references
0 references
0 references
0 references
0 references
0 references
0 references
0 references
0.8116491436958313
0 references
0.8051427602767944
0 references
0.790858268737793
0 references
0.7893089652061462
0 references
