The modeling of realistic chemical vapor infiltration/deposition reactors
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Publication:4933233
DOI10.1002/FLD.2155zbMATH Open1377.76038OpenAlexW1995916831MaRDI QIDQ4933233FDOQ4933233
Authors: John Ibrahim, Samuel Paolucci 
Publication date: 12 October 2010
Published in: International Journal for Numerical Methods in Fluids (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1002/fld.2155
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- scientific article; zbMATH DE number 2201225
low Mach number flowfractional step methodreactive flow in porous mediacarbon depositionchemical vapor deposition/infiltrationStrang splitting operator
Flows in porous media; filtration; seepage (76S05) Chemically reacting flows (80A32) Molecular structure (graph-theoretic methods, methods of differential topology, etc.) (92E10) Reaction effects in flows (76V05)
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Cited In (13)
- Title not available (Why is that?)
- Title not available (Why is that?)
- Modeling and simulation of a chemical vapor deposition
- Robust numerical simulation of porosity evolution in chemical vapor infiltration. III: Three space dimension.
- Robust numerical simulation of porosity evolution in chemical vapor infiltration. I: Two space dimensions
- On numerical issues in time accurate laminar reacting gas flow solvers
- Modelling chemical vapour infiltration of pyrolytic carbon
- Assessment of conservative weighting scheme in simulating chemical vapour deposition with trace species
- Microwave-enhanced chemical vapor infiltration: A sharp interface model
- Title not available (Why is that?)
- Modelling the semi-batch vinyl acetate emulsion polymerization in a real-life industrial reactor
- About modelling chemical vapour infiltration of pyrocarbon
- Title not available (Why is that?)
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