The modeling of realistic chemical vapor infiltration/deposition reactors

DOI10.1002/fld.2155zbMath1377.76038OpenAlexW1995916831MaRDI QIDQ4933233

John Ibrahim, Samuel Paolucci

Publication date: 12 October 2010

Published in: International Journal for Numerical Methods in Fluids (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1002/fld.2155

zbMATH Keywords

fractional step methodlow Mach number flowreactive flow in porous mediacarbon depositionchemical vapor deposition/infiltrationStrang splitting operator

Mathematics Subject Classification ID

Uses Software

• Maple
• SUNDIALS
• UMFPACK
• VODE
• LSODE
• CHEMKIN

Cites Work

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