Robust numerical simulation of porosity evolution in chemical vapor infiltration. I: Two space dimensions
DOI10.1006/JCPH.2000.6550zbMATH Open0984.76060OpenAlexW4250480511MaRDI QIDQ1585367FDOQ1585367
Xinfu Chen, Shi Jin, Xuelei Wang, Thomas L. Starr
Publication date: 7 May 2002
Published in: Journal of Computational Physics (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1006/jcph.2000.6550
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boundary value problemLaplace equationEulerian formulationlevel set equationtopological changeskinetic limitporous solidchemical vapor infiltrationgas-solid reactionsOsher-Sethian schemepore structure evolution
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Cites Work
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- A numerical study of electro-migration voiding by evolving level set functions on a fixed Cartesian grid
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- The Immersed Interface Method for Elliptic Equations with Discontinuous Coefficients and Singular Sources
- Mathematical analysis and optimization of infiltration process
Cited In (7)
- Robust numerical simulation of porosity evolution in chemical vapor infiltration. III: Three space dimension.
- Robust numerical simulation of porosity evolution in chemical vapor infiltration. II: Two-dimensional anisotropic fronts
- Injection Vapour Model in a Porous Medium Accounting for a Weak Condensation
- Microwave-enhanced chemical vapor infiltration: A sharp interface model
- Homogenization of a discrete network model for chemical vapor infiltration process
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- High order anchoring and reinitialization of level set function for simulating interface motion
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