scientific article; zbMATH DE number 6431339
From MaRDI portal
Publication:5248174
Recommendations
- Modeling and simulation of a chemical vapor deposition
- scientific article; zbMATH DE number 5590326
- The modeling of realistic chemical vapor infiltration/deposition reactors
- Arbitrary-pressure chemical vapor deposition modeling using direct simulation Monte Carlo with nonlinear surface chemistry
- A multiscale domain decomposition approach for chemical vapor deposition
- A reduced-basis discretization method for chemical vapor deposition reactor simulation
- Optimization of a thin film deposition process using a dynamic model extracted from molecular simulations
- Numerical study of a three-dimensional chemical vapor deposition reactor with detailed chemistry
- A method for coupling free molecular and continuum regime methods in order to simulate chemical vapor deposition
Cited in
(16)- Adaptive step-size control in simulation of diffusive CVD processes
- Arbitrary-pressure chemical vapor deposition modeling using direct simulation Monte Carlo with nonlinear surface chemistry
- An efficient parallel iteration method for multiscale analysis of chemical vapor deposition processes
- A multiscale domain decomposition approach for chemical vapor deposition
- Model of PE-CVD apparatus: verification and simulations
- A method for coupling free molecular and continuum regime methods in order to simulate chemical vapor deposition
- Fluid flow and transport processes in a large area atmospheric pressure stagnation flow CVD reactor for deposition of thin films
- Identification of influence factors in a thermal model of a plasma-assisted chemical vapor deposition process
- Simulation of a multi-component transport model for the chemical reaction of a CVD-process
- Plasma Carburization of an Axisymmetric Steel Sample
- Assessment of conservative weighting scheme in simulating chemical vapour deposition with trace species
- scientific article; zbMATH DE number 5590326 (Why is no real title available?)
- scientific article; zbMATH DE number 2201225 (Why is no real title available?)
- Modeling and simulation of a chemical vapor deposition
- A reduced-basis discretization method for chemical vapor deposition reactor simulation
- Surface passivation optimization using DIRECT
This page was built for publication:
Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q5248174)