A method for coupling free molecular and continuum regime methods in order to simulate chemical vapor deposition

DOI10.1016/J.COMPFLUID.2012.02.010MaRDI QIDQ2361798zbMATH OpenOpenAlexFDO

Authors Jonathan Jilesen, Fue-Sang Lien

Publication date 5 July 2017

Published in Computers and Fluids (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1016/j.compfluid.2012.02.010

zbMATH Keywords

chemical vapor depositionfully integratedmulti-scalesilicon

Mathematics Subject Classification ID

Navier-Stokes equations for incompressible viscous fluids (76D05) Finite volume methods applied to problems in fluid mechanics (76M12) Rarefied gas flows, Boltzmann equation in fluid mechanics (76P05) Reaction effects in flows (76V05)

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Cites work

• A calculation procedure for heat, mass and momentum transfer in three- dimensional parabolic flows
• A stable and accurate convective modelling procedure based on quadratic upstream interpolation
• Direct simulation of gas flows at the molecular level
• Numerical study of the turbulent flow past an airfoil with trailing edge separation

Cited in

(9)

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• An efficient parallel iteration method for multiscale analysis of chemical vapor deposition processes
• A multiscale domain decomposition approach for chemical vapor deposition
• The direction decoupled quiet direct simulation method for rapid simulation of axisymmetric inviscid unsteady flow in pulsed pressure chemical vapour deposition
• Micro and macro scale technique for strongly coupled two-phase flows simulation
• Assessment of conservative weighting scheme in simulating chemical vapour deposition with trace species
• scientific article; zbMATH DE number 5590326 (Why is no real title available?)
• scientific article; zbMATH DE number 6431339 (Why is no real title available?)
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