Features of the formation of silicon nanocrystals upon the annealing of SiO\(_2\) layers implanted with Si ions (Q693973)
From MaRDI portal
 | This is the item page for this Wikibase entity, intended for internal use and editing purposes. Please use this page instead for the normal view: Features of the formation of silicon nanocrystals upon the annealing of SiO\(_2\) layers implanted with Si ions |
scientific article
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Features of the formation of silicon nanocrystals upon the annealing of SiO\(_2\) layers implanted with Si ions |
scientific article |
Statements
Features of the formation of silicon nanocrystals upon the annealing of SiO\(_2\) layers implanted with Si ions (English)
0 references
11 December 2012
0 references
