A combination of characteristics and Monte Carlo methods for etch profile simulation

DOI10.1016/S0096-3003(97)10017-0MaRDI QIDQ1294150zbMATH OpenOpenAlexFDO

Authors K. Appert

Publication date 1998

Published in Applied Mathematics and Computation (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1016/s0096-3003(97)10017-0

Mathematics Subject Classification ID

Recommendations

• scientific article; zbMATH DE number 1278671
• The Monte Carlo flux method
• A level set approach to a unified model for etching, deposition, and lithography. II: Three-dimensional simulations

Cited in

(1)

• ETCH PROFILE EVOLUTION IN LOW PRESSURE RF PLASMA WITH AXIAL MAGNETIC FIELD

Describes a project that uses

Uses Software

• pchip
• UNCMND

This page was built for publication: A combination of characteristics and Monte Carlo methods for etch profile simulation

Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q1294150)