Coupling of morphology and chemistry leads to morphogenesis in electrochemical metal growth: a review of the reaction-diffusion approach
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Publication:1928109
DOI10.1007/s10440-012-9725-zzbMath1256.35176WikidataQ62027854 ScholiaQ62027854MaRDI QIDQ1928109
Claudio Mele, Benedetto Bozzini, Ivonne Sgura, Deborah Lacitignola
Publication date: 2 January 2013
Published in: Acta Applicandae Mathematicae (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1007/s10440-012-9725-z
travelling waves; pattern formation; numerical simulations; mathematical modelling; electrochemistry; electrodeposition; corrosion; reaction diffusion; plating
92E99: Chemistry
35K57: Reaction-diffusion equations
35Q92: PDEs in connection with biology, chemistry and other natural sciences
92-08: Computational methods for problems pertaining to biology
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Uses Software
Cites Work
- Numerical approximation of Turing patterns in electrodeposition by ADI methods
- Travelling waves in a reaction-diffusion model for electrodeposition
- High order generalized upwind schemes and numerical solution of singular perturbation problems
- High-order finite difference schemes for the solution of second-order BVPs
- Morphological spatial patterns in a reaction diffusion model for metal growth
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