Coupling of morphology and chemistry leads to morphogenesis in electrochemical metal growth: a review of the reaction-diffusion approach

DOI10.1007/s10440-012-9725-zzbMath1256.35176OpenAlexW2020474192WikidataQ62027854 ScholiaQ62027854MaRDI QIDQ1928109

Claudio Mele, Benedetto Bozzini, Ivonne Sgura, Deborah Lacitignola

Publication date: 2 January 2013

Published in: Acta Applicandae Mathematicae (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1007/s10440-012-9725-z

zbMATH Keywords

travelling wavespattern formationnumerical simulationsmathematical modellingelectrochemistryelectrodepositioncorrosionreaction diffusionplating

Mathematics Subject Classification ID

Chemistry (92E99) Reaction-diffusion equations (35K57) PDEs in connection with biology, chemistry and other natural sciences (35Q92) Computational methods for problems pertaining to biology (92-08)

Related Items (12)

Turing instability and pattern formation for the Lengyel-Epstein system with nonlinear diffusion ⋮ Spatio-temporal organization in a morphochemical electrodeposition model: analysis and numerical simulation of spiral waves ⋮ Spatio-temporal organization in a morphochemical electrodeposition model: Hopf and Turing instabilities and their interplay ⋮ Numerical approximation of Turing patterns in electrodeposition by ADI methods ⋮ Devising efficient numerical methods for oscillating patterns in reaction-diffusion systems ⋮ Parameter identification through mode isolation for reaction–diffusion systems on arbitrary geometries ⋮ Turing pattern formation on the sphere for a morphochemical reaction-diffusion model for electrodeposition ⋮ Weakly nonlinear analysis of Turing patterns in a morphochemical model for metal growth ⋮ A well-posedness result for a system of cross-diffusion equations ⋮ Cross-diffusion effects on a morphochemical model for electrodeposition ⋮ Parameter estimation for a morphochemical reaction-diffusion model of electrochemical pattern formation ⋮ New two-derivative implicit-explicit Runge-Kutta methods for stiff reaction-diffusion systems

Uses Software

• COMSOL

Cites Work

• Unnamed Item
• Numerical approximation of Turing patterns in electrodeposition by ADI methods
• Travelling waves in a reaction-diffusion model for electrodeposition
• High order generalized upwind schemes and numerical solution of singular perturbation problems
• High-order finite difference schemes for the solution of second-order BVPs
• Morphological spatial patterns in a reaction diffusion model for metal growth

This page was built for publication: Coupling of morphology and chemistry leads to morphogenesis in electrochemical metal growth: a review of the reaction-diffusion approach