Numerical approximation of Turing patterns in electrodeposition by ADI methods
DOI10.1016/j.cam.2012.03.013zbMath1246.65175OpenAlexW2001538622WikidataQ62027855 ScholiaQ62027855MaRDI QIDQ433963
Deborah Lacitignola, Benedetto Bozzini, Ivonne Sgura
Publication date: 9 July 2012
Published in: Journal of Computational and Applied Mathematics (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1016/j.cam.2012.03.013
stabilitynumerical examplesmethod of linessemi-discretizationsystem of reaction-diffusion equationsTuring patternsADI methodsalternating direction implicitCrank-NicolsonSchnakenberg modelhigh order finite difference schemeselectrodeposition modelIMEX methods
Reaction-diffusion equations (35K57) Finite difference methods for initial value and initial-boundary value problems involving PDEs (65M06) Stability and convergence of numerical methods for initial value and initial-boundary value problems involving PDEs (65M12) Method of lines for initial value and initial-boundary value problems involving PDEs (65M20) Electrochemistry (78A57)
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