Numerical approximation of Turing patterns in electrodeposition by ADI methods
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numerical examplesstabilitymethod of linesCrank-NicolsonSchnakenberg modelsemi-discretizationTuring patternshigh order finite difference schemesADI methodsalternating direction implicitelectrodeposition modelIMEX methodssystem of reaction-diffusion equations
Reaction-diffusion equations (35K57) Finite difference methods for initial value and initial-boundary value problems involving PDEs (65M06) Stability and convergence of numerical methods for initial value and initial-boundary value problems involving PDEs (65M12) Method of lines for initial value and initial-boundary value problems involving PDEs (65M20) Electrochemistry (78A57)
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Cites work
- scientific article; zbMATH DE number 1161476 (Why is no real title available?)
- scientific article; zbMATH DE number 1894331 (Why is no real title available?)
- scientific article; zbMATH DE number 815352 (Why is no real title available?)
- A finite differences MATLAB code for the numerical solution of second order singular perturbation problems
- An Implicit-Explicit Runge--Kutta--Chebyshev Scheme for Diffusion-Reaction Equations
- An efficient and robust numerical algorithm for estimating parameters in Turing systems
- Coupling of morphology and chemistry leads to morphogenesis in electrochemical metal growth: a review of the reaction-diffusion approach
- High order generalized upwind schemes and numerical solution of singular perturbation problems
- High-order finite difference schemes for the solution of second-order BVPs
- IMEX Runge-Kutta schemes for reaction-diffusion equations
- IRKC: an IMEX solver for stiff diffusion-reaction PDEs
- Implicit-Explicit Methods for Time-Dependent Partial Differential Equations
- Implicit-explicit methods for reaction-diffusion problems in pattern formation
- Morphological spatial patterns in a reaction diffusion model for metal growth
- On the stability of implicit-explicit linear multistep methods
- The unreasonable effectiveness of mathematics in the natural sciences. Richard courant lecture in mathematical sciences delivered at New York University, May 11, 1959
- Time-stepping schemes for moving grid finite elements applied to reaction-diffusion systems on fixed and growing domains
- Travelling waves in a reaction-diffusion model for electrodeposition
- Velocity-induced numerical solutions of reaction-diffusion systems on continuously growing domains
Cited in
(26)- A Meshfree Approach Based on Moving Kriging Interpolation for Numerical Solution of Coupled Reaction-Diffusion Problems
- Spatio-temporal organization in a morphochemical electrodeposition model: analysis and numerical simulation of spiral waves
- Cross-diffusion effects on a morphochemical model for electrodeposition
- Travelling waves in a reaction-diffusion model for electrodeposition
- Parameter estimation for a morphochemical reaction-diffusion model of electrochemical pattern formation
- Weakly nonlinear analysis of Turing patterns in a morphochemical model for metal growth
- An ADI extrapolated Crank-Nicolson orthogonal spline collocation method for nonlinear reaction-diffusion systems on evolving domains
- Coupling of morphology and chemistry leads to morphogenesis in electrochemical metal growth: a review of the reaction-diffusion approach
- Matrix-oriented discretization methods for reaction-diffusion PDEs: comparisons and applications
- Turing patterns in a 3D morpho-chemical bulk-surface reaction-diffusion system for battery modeling
- Interpolatory super-convergent discontinuous Galerkin methods for nonlinear reaction diffusion equations on three dimensional domains
- An interpolatory directional splitting-local discontinuous Galerkin method with application to pattern formation in 2D/3D
- Spatiotemporal pattern formations in stiff reaction-diffusion systems by new time marching methods
- A three level finite element approximation of a pattern formation model in developmental biology
- Convergence analysis and error estimate of second-order implicit–explicit scheme for Gray-Scott model
- A nonoscillatory second-order time-stepping procedure for reaction-diffusion equations
- New two-derivative implicit-explicit Runge-Kutta methods for stiff reaction-diffusion systems
- Stabilized implicit-explicit integrating factor Runge-Kutta schemes: construction, analysis and applications to stiff PDEs
- Bifurcations in twinkling patterns for the Lengyel-Epstein reaction-diffusion model
- Adaptive POD-DEIM correction for Turing pattern approximation in reaction-diffusion PDE systems
- Devising efficient numerical methods for oscillating patterns in reaction-diffusion systems
- Phase-field modeling and simulations for dendrite growth in electrodeposition
- Patterns in soil organic carbon dynamics: integrating microbial activity, chemotaxis and data-driven approaches
- Pattern formation: reactivity is not necessary for chemotaxis--driven instabilities
- Preconditioned implicit-exponential integrators (IMEXP) for stiff PDEs
- Spatio-temporal organization in a morphochemical electrodeposition model: Hopf and Turing instabilities and their interplay
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