3D sputtering simulations of the CZTS, Si and CIGS thin films using Monte-Carlo method

DOI10.1515/MCMA-2021-2094zbMath1484.82081OpenAlexW3210521597MaRDI QIDQ2066983

Abdelkader Bouazza, Salah Eddine Chouaib Refas, Youcef Belhadji

Publication date: 17 January 2022

Published in: Monte Carlo Methods and Applications (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1515/mcma-2021-2094

zbMATH Keywords

thin filmssputtering yieldsputteringMonte-Carlo (Mc) simulation

Mathematics Subject Classification ID

Statistical mechanics of semiconductors (82D37) Monte Carlo methods applied to problems in statistical mechanics (82M31)

Uses Software

• SDTrimSP

Cites Work

• Study and simulation of the sputtering process of material layers in plasma
• Understanding the contribution of energy and angular distribution in the morphology of thin films using Monte Carlo simulation

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