Study and simulation of the sputtering process of material layers in plasma

DOI10.1515/MCMA-2016-0106zbMath1338.82052OpenAlexW2407680503MaRDI QIDQ293514

Abderrahmane Settaouti, Abdelkader Bouazza

Publication date: 9 June 2016

Published in: Monte Carlo Methods and Applications (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1515/mcma-2016-0106

zbMATH Keywords

Monte Carlo simulationsenergy distributionangular distributionsputtering processsputtering yield

Mathematics Subject Classification ID

Relationships between surfaces, higher-dimensional varieties, and physics (14J81) Statistical mechanics of metals (82D35) Statistical mechanics of plasmas (82D10) Physics (00A79)

Related Items (2)

Understanding the contribution of energy and angular distribution in the morphology of thin films using Monte Carlo simulation ⋮ 3D sputtering simulations of the CZTS, Si and CIGS thin films using Monte-Carlo method

Uses Software

• SRIM

Cites Work

• NUMERICAL SIMULATION OF THE FORMATION AND PROPAGATION OF STREAMER

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