Effective resistance is more than distance: Laplacians, simplices and the Schur complement

DOI10.1016/J.LAA.2022.01.002MaRDI QIDQ2074965zbMATH OpenOpenAlexFDO

Authors Karel Devriendt

Publication date 11 February 2022

Published in Linear Algebra and its Applications (Search for Journal in Brave)

Full work available at URL https://arxiv.org/abs/2010.04521

zbMATH Keywords

simplexLaplacianSchur complementeffective resistance

Mathematics Subject Classification ID

Graphs and linear algebra (matrices, eigenvalues, etc.) (05C50) Distance in graphs (05C12) Distance geometry (51K99) Polytopes and polyhedra (52B99)

Abstract: This article discusses a geometric perspective on the well-known fact in graph theory that the effective resistance is a metric on the nodes of a graph. The classical proofs of this fact make use of ideas from electrical circuits or random walks; here we describe an alternative approach which combines geometric (using simplices) and algebraic (using the Schur complement) ideas. These perspectives are unified in a matrix identity of Miroslav Fiedler, which beautifully summarizes a number of related ideas at the intersection of graphs, Laplacian matrices and simplices, with the metric property of the effective resistance as a prominent consequence.

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Cited in

(14)

• Effective graph resistance
• Total positivity in multivariate extremes
• Resistance distance and the normalized Laplacian spectrum
• Metric and ultrametric spaces of resistances
• Resistance distances on networks
• Shift operators from the simplex representation in momentum-space CFT
• Variance and covariance of distributions on graphs
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