Analysis of vertical cracking phenomena in tensile-strained epitaxial film on a substrate. I: Mathematical formulation
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Publication:2459889
DOI10.1016/j.ijsolstr.2005.05.002zbMath1121.74452OpenAlexW2124926815MaRDI QIDQ2459889
Publication date: 8 November 2007
Published in: International Journal of Solids and Structures (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1016/j.ijsolstr.2005.05.002
channeling crackvertical crackcontinuous distributions of dislocationscritical condition for crack formationepitaxial film/substrate systemAnisotropic elasticity
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