Implementation of sub-Rayleigh-resolution lithography using anN-photon absorber

DOI10.1080/09500340600895656zbMATH Open1121.78359OpenAlexW2066546597MaRDI QIDQ3429397FDOQ3429397

Authors: Hye Jeong Chang, Heedeuk Shin, Malcolm N. O'Sullivan-Hale, Robert W. Boyd 

Publication date: 30 March 2007

Published in: Journal of Modern Optics (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1080/09500340600895656

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zbMATH Keywords

quantum lithographyRayleigh limitmulti-photon absorbing material

Mathematics Subject Classification ID

Technical applications of optics and electromagnetic theory (78A55) Lasers, masers, optical bistability, nonlinear optics (78A60)

Cited In (2)

• Development of optical naphthalene sublimation method
• Nanoscale resolution lens axicon for high density optical recording using krypton ion laser

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