Implementation of sub-Rayleigh-resolution lithography using anN-photon absorber

DOI10.1080/09500340600895656MaRDI QIDQ3429397zbMATHOpenAlexFDO

Authors Hye Jeong Chang, Heedeuk Shin, Malcolm N. O'Sullivan-Hale, Robert W. Boyd

Publication date 30 March 2007

Published in Journal of Modern Optics (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1080/09500340600895656

zbMATH Keywords

quantum lithographyRayleigh limitmulti-photon absorbing material

Mathematics Subject Classification ID

Technical applications of optics and electromagnetic theory (78A55) Lasers, masers, optical bistability, nonlinear optics (78A60)

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