Multiscale analysis of nonequilibrium rarefied gas flows with the application to silicon thin film process employing supersonic jet

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Publication:3554397

DOI10.1063/1.1659745zbMATH Open1186.76457OpenAlexW1973167340MaRDI QIDQ3554397FDOQ3554397

Yoichiro Matsumoto, Shu Takagi, Y. Sakiyama

Publication date: 22 April 2010

Published in: Physics of Fluids (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1063/1.1659745





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