Sequential Screening in Semiconductor Manufacturing, II: Exploiting Lot-to-Lot Variability
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Publication:4883213
DOI10.1287/OPRE.44.1.196zbMATH Open0847.90072OpenAlexW4245148564MaRDI QIDQ4883213FDOQ4883213
Authors: Jihong Ou, Lawrence M. Wein
Publication date: 13 October 1996
Published in: Operations Research (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1287/opre.44.1.196
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Cited In (6)
- Knowledge acquisition from batch semiconductor manufacturing data
- Optimal reduction of a spatial monitoring grid: proposals and applications in process control
- Determining the optimal probing lot size for the wafer probe operation in semiconductor manufacturing
- Sequential Screening in Semiconductor Manufacturing, I: Exploiting Spatial Dependence
- Designing repetitive screening procedures with imperfect inspections: an empirical Bayes approach
- The effect of testing equipment shift on optimal decisions in a repetitive testing process
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