Critical phases in the raise and peel model
From MaRDI portal
Publication:4964591
DOI10.1088/1742-5468/AABC7FzbMATH Open1459.82211arXiv1802.02401OpenAlexW2786497981MaRDI QIDQ4964591FDOQ4964591
Authors: D. A. C. Jara, F. C. Alcaraz
Publication date: 2 March 2021
Published in: Journal of Statistical Mechanics: Theory and Experiment (Search for Journal in Brave)
Abstract: The raise and peel model (RPM) is a nonlocal stochastic model describing the space and time fluctuations of an evolving one dimensional interface. Its relevant parameter is the ratio between the rates of local adsorption and nonlocal desorption processes (avalanches) processes. The model at give us the first example of a conformally invariant stochastic model. For small values the model is known to be noncritical, while for it is critical. By calculating the structure function of the height profiles in the reciprocal space we confirm with good precision that indeed . We establish that at the conformal invariant point the RPM has a roughness transition with dynamical and roughness critical exponents and , respectively. For the model is critical with an -dependent dynamical critical exponent that tends towards zero as . However at the RPM is exactly mapped into the totally asymmetric exclusion problem (TASEP). This last model is known to be noncritical (critical) for open (periodic) boundary conditions. Our studies indicate that the RPM as , due to its nonlocal dynamics processes, has the same large-distance physics no matter what boundary condition we chose. For , our analysis show that differently from previous predictions, the region is composed by two distinct critical phases. For the height profiles are rough (), and for the height profiles are flat at large distances (). We also observed that in both critical phases () the RPM at short length scales, has an effective behavior in the Kardar-Parisi-Zhang (KPZ) critical universality class, that is not the true behavior of the system at large length scales.
Full work available at URL: https://arxiv.org/abs/1802.02401
Recommendations
- Critical behaviour in a non-local interface model
- Nonlocal asymmetric exclusion process on a ring and conformal invariance
- The raise and peel model of a fluctuating interface
- Conformal invariance and its breaking in a stochastic model of a fluctuating interface
- Avalanches in the raise and peel model in the presence of a wall
Cites Work
- Correlation functions in conformal invariant stochastic processes
- Exact solution of a 1D asymmetric exclusion model using a matrix formulation
- Spin chains and combinatorics
- Nonlocal asymmetric exclusion process on a ring and conformal invariance
- The raise and peel model of a fluctuating interface
- Exact diffusion constant for the one-dimensional partially asymmetric exclusion model
- Quasi-stationary states in nonlocal stochastic growth models with infinitely many absorbing states
- Conformal invariance and its breaking in a stochastic model of a fluctuating interface
Cited In (4)
This page was built for publication: Critical phases in the raise and peel model
Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q4964591)