A numerical method for the optimization of the diffraction efficiency of thin-layer coatings with diffraction gratings

DOI10.1134/S0012266123030114MaRDI QIDQ6155441zbMATH OpenOpenAlexFDO

Authors V. Yu. Martynova, Yu G. Smirnov, A. V. Tikhonravov

Publication date 12 June 2023

Published in Differential Equations (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1134/s0012266123030114

zbMATH Keywords

optimizationdiffraction gratingslasermultilayeroptoelectronic devicesanalytical gradient calculation

Mathematics Subject Classification ID

Numerical optimization and variational techniques (65K10) Parallel numerical computation (65Y05) Diffraction, scattering (78A45) Lasers, masers, optical bistability, nonlinear optics (78A60) Laplace operator, Helmholtz equation (reduced wave equation), Poisson equation (35J05) Partial functional-differential equations (35R10) Numerical methods for eigenvalue problems for boundary value problems involving PDEs (65N25) Thin films (74K35) Waves and radiation in optics and electromagnetic theory (78A40) Composite media; random media in optics and electromagnetic theory (78A48) Analyticity in context of PDEs (35A20) Optimization problems in optics and electromagnetic theory (78M50)

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Cites work

• Computationally efficient algorithm for designing multilayer dielectric gratings

Cited in

(9)

• scientific article; zbMATH DE number 409802 (Why is no real title available?)
• Independent electromagnetic optimization of the two coating thicknesses of a dielectric layer on the facets of an echelle grating in Littrow mount
• scientific article; zbMATH DE number 1878640 (Why is no real title available?)
• Parameter optimization problems for multilayer optical coatings
• Optimisation of a rectangular-profile diffraction grating
• Computationally efficient algorithm for designing multilayer dielectric gratings
• Improvement of the Diffraction Coefficient of GTD by Using Multiplicative Calculus
• The Integral Method for Coated Gratings: Computational Cost
• Optimization of electromagnetic fields in holographic lithography using the method of local variations

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