Pattern scaling effect on the radiative properties of wafer's surface
DOI10.1007/S11431-010-3230-2zbMATH Open1205.78010OpenAlexW2054008425MaRDI QIDQ617204FDOQ617204
Authors: AiHua Wang, Jiu-Ju Cai 
Publication date: 21 January 2011
Published in: Science China. Technological Sciences (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1007/s11431-010-3230-2
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Technical applications of optics and electromagnetic theory (78A55) Finite difference methods applied to problems in optics and electromagnetic theory (78M20) Electromagnetic theory (general) (78A25) Waves and radiation in optics and electromagnetic theory (78A40)
Cites Work
Cited In (5)
- Device scaling effect on the spectral-directional absorptance of Wafer's front side
- Modeling radiative properties of nanoscale patterned wafers
- Investigation on the temperature-dependence of absorption properties of solar cells with micro-structured surfaces
- Effects of nanoscale features on infrared radiative properties of heavily doped silicon complex gratings
- Effects of water and iso-propyl alcohol relative humidities on single wafer cleaning system performance
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