Construction of parameterizations of masks for tight wavelet frames with two symmetric/antisymmetric generators and applications in image compression and denoising

From MaRDI portal
Publication:629460







Cites work









This page was built for publication: Construction of parameterizations of masks for tight wavelet frames with two symmetric/antisymmetric generators and applications in image compression and denoising

Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q629460)