Kinetic plasma simulations for three dielectric etchers

DOI10.1016/J.CPC.2007.02.070zbMATH Open1196.82051OpenAlexW1967574375MaRDI QIDQ710204FDOQ710204

Authors: D. Kharzeev 

Publication date: 18 October 2010

Published in: Computer Physics Communications (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.cpc.2007.02.070

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zbMATH Keywords

particle simulationcapacitively coupled plasmadual-frequencyetcherMonte Carlo collision

Mathematics Subject Classification ID

Statistical mechanics of plasmas (82D10)

Cited In (4)

• Sparse field level set method for non-convex Hamiltonians in 3D plasma etching profile simulations
• PIC-MCC simulations of capacitive high-frequency discharge dynamics with nanoparticles
• 1D-3V PIC-MCC based modeling and simulation of magnetized low-temperature plasmas
• Three-dimensional discharge simulation of inductively coupled plasma (ICP) etching reactor

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