An inverse heat transfer method to provide near-isothermal surface for disc heaters used in microlithography
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Publication:856629
DOI10.1016/J.IJHEATMASSTRANSFER.2006.04.019zbMATH Open1113.80326OpenAlexW2058457567MaRDI QIDQ856629FDOQ856629
Authors: Arunn Narasimhan, Satish Karra
Publication date: 7 December 2006
Published in: International Journal of Heat and Mass Transfer (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1016/j.ijheatmasstransfer.2006.04.019
inverse heat transferscale analysissilicon wafermicrolithographypost-exposure baketemperature uniformity
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