A three‐dimensional numerical method for thermal analysis in X‐ray lithography (Q4700816): Difference between revisions
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| Property / author: R. F. Nassar / rank | |||
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| Property / author: R. F. Nassar / rank | |||
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| Property / MaRDI profile type: MaRDI publication profile / rank | |||
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| Property / full work available at URL: https://doi.org/10.1108/09615539810213188 / rank | |||
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| Property / OpenAlex ID: W1988190738 / rank | |||
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| Property / cites work: A generalized Douglas ADI method for solving three‐dimensional parabolic differential equations on multilayers / rank | |||
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| Property / cites work: Preconditioned Chebyshev collocation methods and triangular finite elements / rank | |||
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Latest revision as of 09:01, 29 May 2024
scientific article; zbMATH DE number 1358252
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | A three‐dimensional numerical method for thermal analysis in X‐ray lithography |
scientific article; zbMATH DE number 1358252 |
Statements
A three‐dimensional numerical method for thermal analysis in X‐ray lithography (English)
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9 May 2000
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finite difference method
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microfabrication
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multilayers
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photoresist
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preconditioned Richardson method
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Poisson equation
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domain decomposition algorithm
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