A level set approach to a unified model for etching, deposition, and lithography. III: Redeposition, reemission, surface diffusion, and complex simulations (Q1377900): Difference between revisions
From MaRDI portal
Latest revision as of 10:34, 28 May 2024
scientific article
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | A level set approach to a unified model for etching, deposition, and lithography. III: Redeposition, reemission, surface diffusion, and complex simulations |
scientific article |
Statements
A level set approach to a unified model for etching, deposition, and lithography. III: Redeposition, reemission, surface diffusion, and complex simulations (English)
0 references
17 February 1998
0 references
level set formulation
0 references
topography simulation
0 references
deposition, etching, and lithography processes
0 references
integrated circuit fabrication
0 references
Hamilton-Jacobi type equation
0 references
propagating level set function
0 references
hyperbolic conservation laws
0 references
redeposition
0 references
reemission
0 references
surface diffusion
0 references
transport equations
0 references
thin film layers
0 references
0 references
0 references
0 references
0 references
0 references
