A combination of characteristics and Monte Carlo methods for etch profile simulation

DOI10.1016/S0096-3003(97)10017-0MaRDI QIDQ1294150zbMATH OpenOpenAlexFDO

Authors K. Appert

Publication date 1998

Published in Applied Mathematics and Computation (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1016/s0096-3003(97)10017-0

Mathematics Subject Classification ID

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Cited in

(1)

• ETCH PROFILE EVOLUTION IN LOW PRESSURE RF PLASMA WITH AXIAL MAGNETIC FIELD

Describes a project that uses

Uses Software

• UNCMND
• pchip

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