ETCH PROFILE EVOLUTION IN LOW PRESSURE RF PLASMA WITH AXIAL MAGNETIC FIELD

DOI10.1108/EB051885MaRDI QIDQ4835958zbMATH OpenOpenAlexFDO

Authors B. P. Mathur, K. I. Arshak, D. McDonagh, A. Arshak

Publication date 8 June 1995

Published in COMPEL: The International Journal for Computation and Mathematics in Electrical and Electronic Engineering (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1108/eb051885

zbMATH Keywords

analytical solutionion fluxmacrouniformitymicrouniformityphotoresistor

Mathematics Subject Classification ID

Rarefied gas flows, Boltzmann equation in fluid mechanics (76P05) Motion of charged particles (78A35) Ionized gas flow in electromagnetic fields; plasmic flow (76X05)

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Cited in

(1)

• Effect of RF-discharge on silicon etching in CF₄/O₂

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