ETCH PROFILE EVOLUTION IN LOW PRESSURE RF PLASMA WITH AXIAL MAGNETIC FIELD (Q4835958)
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scientific article; zbMATH DE number 762202
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| English | ETCH PROFILE EVOLUTION IN LOW PRESSURE RF PLASMA WITH AXIAL MAGNETIC FIELD |
scientific article; zbMATH DE number 762202 |
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ETCH PROFILE EVOLUTION IN LOW PRESSURE RF PLASMA WITH AXIAL MAGNETIC FIELD (English)
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8 June 1995
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photoresistor
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analytical solution
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ion flux
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microuniformity
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macrouniformity
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0.6926235556602478
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0.6577457189559937
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0.6519535183906555
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