Three-dimensional discharge simulation of inductively coupled plasma (ICP) etching reactor (Q941774)
From MaRDI portal
!
This is the item page for this Wikibase entity, intended for internal use and editing purposes. Please use the normal view instead:
scientific article; zbMATH DE number 5319265
| Language | Label | Description | Also known as |
|---|---|---|---|
| default for all languages | No label defined |
||
| English | Three-dimensional discharge simulation of inductively coupled plasma (ICP) etching reactor |
scientific article; zbMATH DE number 5319265 |
Statements
Three-dimensional discharge simulation of inductively coupled plasma (ICP) etching reactor (English)
0 references
2 September 2008
0 references
inductively coupled plasma
0 references
electron density
0 references
electron temperature
0 references
power deposition
0 references
0.727763295173645
0 references
0.7120912671089172
0 references
0.710088312625885
0 references
0.7037283182144165
0 references
