Effect of RF-discharge on silicon etching in CF\(_4/\)O\(_2\) (Q3056643)
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scientific article; zbMATH DE number 5815878
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| English | Effect of RF-discharge on silicon etching in CF\(_4/\)O\(_2\) |
scientific article; zbMATH DE number 5815878 |
Statements
12 November 2010
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ion etcher
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silicon etching
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plasma etching
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0.7037283182144165
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0.6926235556602478
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0.6791406273841858
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