Detecting Spatial Effects from Factorial Experiments: An Application from Integrated-Circuit Manufacturing

DOI10.2307/1269660MaRDI QIDQ4694631zbMATH OpenOpenAlexFDO

Authors Winson Taam, Michael S. Hamada

Publication date 6 September 1993

Full work available at URL https://doi.org/10.2307/1269660

Mathematics Subject Classification ID

Factorial statistical designs (62K15) Survival analysis and censored data (62N99)

Cited in

(6)

• A quasi-likelihood approach to model bernoulli data with spatial dependence
• Wafer bin map recognition using a neural network approach
• Adjacency-clustering and its application for yield prediction in integrated circuit manufacturing
• Automatic identification of spatial defect patterns for semiconductor manufacturing
• Clustering partially masked images with modified Radon transformation
• Model-based clustering for integrated circuit yield enhancement

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