Front Tracking Simulations of Ion Deposition and Resputtering

DOI10.1137/S1064827597318393MaRDI QIDQ4253095zbMATH OpenFDO

Authors Santiago R. Simanca, Dechun Tan, F. M. Tangerman, G. Vanderwoude, James Glimm

Publication date 24 June 1999

Published in SIAM Journal on Scientific Computing (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1137/S1064827597318393

zbMATH Keywords

interface evolutionRiemann problemsRiemann solverssharply defined cusps and corners

Mathematics Subject Classification ID

Theoretical approximation in context of PDEs (35A35) Boundary value problems for nonlinear first-order PDEs (35F30) Shocks and singularities for hyperbolic equations (35L67) Shock waves and blast waves in fluid mechanics (76L05)

Review text

This paper describes a surface evolution formulated in the terms of a Hamilton-Jacobi equation and extends the front tracking algorithm to three dimensions, for the solutions of ion etching and deposition problems. The front tracked in etching and deposition processes is the interface between the solid material and the ambient gas or vacuum. A mathematical description of the evolution process is obtained when the evolving interface at time \(t\) is represented as the level set of a function \(\Phi(X,t)= 0\). The interface evolution is described in the form of a Hamilton-Jacobi equation \[ \Phi_t(X, t)+ H(X,\Phi,\nabla\Phi(X))= 0, \] \[ H(X,\Phi, \nabla\Phi(X))= C\Biggl(X, \Phi, {\nabla\Phi(X)\over |\nabla\Phi(X)|}\Biggr)|\nabla\Phi(X)|. \] The front tracking method gives physically admissible solutions with sharply defined cusps and corners, even with relatively coarse grids. The algorithm uses, within its propagation step, Riemann solvers based on proven admissibility criteria.

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(5)

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• A level set approach to a unified model for etching, deposition, and lithography. II: Three-dimensional simulations
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• A free boundary problem for a Hamilton-Jacobi equation arising in ion etching

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