Reactive magnetron sputter deposition of (Ti, Cu)N nano-crystalline thin films: modeling of particle and energy flux toward the substrate (Q2844867)
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scientific article; zbMATH DE number 6199631
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| English | Reactive magnetron sputter deposition of (Ti, Cu)N nano-crystalline thin films: modeling of particle and energy flux toward the substrate |
scientific article; zbMATH DE number 6199631 |
Statements
20 August 2013
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0.8324424
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Reactive magnetron sputter deposition of (Ti, Cu)N nano-crystalline thin films: modeling of particle and energy flux toward the substrate (English)
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