Reactive magnetron sputter deposition of (Ti, Cu)N nano-crystalline thin films: modeling of particle and energy flux toward the substrate

DOI10.1088/0031-8949/86/02/025301zbMATH Open1282.82065OpenAlexW2050966084MaRDI QIDQ2844867FDOQ2844867

Authors: A. Rahmati 

Publication date: 20 August 2013

Published in: Physica Scripta (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1088/0031-8949/86/02/025301

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Mathematics Subject Classification ID

Molecular physics (81V55) Statistical mechanics of nanostructures and nanoparticles (82D80)

Cited In (2)

• 3D sputtering simulations of the CZTS, Si and CIGS thin films using Monte-Carlo method
• The basic structure of Ti-Si-N superhard nanocomposite coatings: ab initio studies

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