An Asymptotic Analysis for a Model of Chemical Vapor Deposition on a Microstructured Surface (Q4388845)
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scientific article; zbMATH DE number 1150611
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| English | An Asymptotic Analysis for a Model of Chemical Vapor Deposition on a Microstructured Surface |
scientific article; zbMATH DE number 1150611 |
Statements
An Asymptotic Analysis for a Model of Chemical Vapor Deposition on a Microstructured Surface (English)
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10 May 1998
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time-dependent initial-boundary value problems
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homogenization
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singular perturbation
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heat and mass transfer
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chemically reacting flows, asymptotic analysis
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chemical vapor deposition
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adsorption of gas
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microstructured surface
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0.7729750275611877
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0.7645502686500549
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