Development of a new simulation model of spin coating process and its application to optimize the 450 mm wafer coating process (Q974890)
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| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Development of a new simulation model of spin coating process and its application to optimize the 450 mm wafer coating process |
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Development of a new simulation model of spin coating process and its application to optimize the 450 mm wafer coating process (English)
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8 June 2010
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spin coating
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photoresist
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photoresist consumption minimization
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wafer enlargement
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