Development of a new simulation model of spin coating process and its application to optimize the 450 mm wafer coating process (Q974890)
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scientific article; zbMATH DE number 5718069
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| English | Development of a new simulation model of spin coating process and its application to optimize the 450 mm wafer coating process |
scientific article; zbMATH DE number 5718069 |
Statements
Development of a new simulation model of spin coating process and its application to optimize the 450 mm wafer coating process (English)
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8 June 2010
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spin coating
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photoresist
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photoresist consumption minimization
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wafer enlargement
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0.7181042432785034
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0.7150416374206543
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0.7060067653656006
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0.7023845314979553
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0.6919746994972229
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