Development of a new simulation model of spin coating process and its application to optimize the 450 mm wafer coating process

DOI10.1016/J.IJHEATMASSTRANSFER.2010.01.018zbMATH Open1305.76012OpenAlexW2004666264MaRDI QIDQ974890FDOQ974890

Authors: Jung-Yeul Jung, Junemo Koo, Yong-Tae Kang 

Publication date: 8 June 2010

Published in: International Journal of Heat and Mass Transfer (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.ijheatmasstransfer.2010.01.018

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zbMATH Keywords

spin coatingphotoresistphotoresist consumption minimizationwafer enlargement

Mathematics Subject Classification ID

Thin fluid films (76A20)

Cites Work

• Flow of a Viscous Liquid on a Rotating Disk

Cited In (1)

• Surface instability of thin polymer resist films with phase change effects on coating flow using numerical approximation techniques

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