Modeling and simulation of thermal chlorine etching of gallium arsenide with application to real-time feedback control

DOI10.1016/S0895-7177(01)00169-8zbMATH Open1003.92040MaRDI QIDQ1609469FDOQ1609469

R. Smith

Publication date: 15 August 2002

Published in: Mathematical and Computer Modelling (Search for Journal in Brave)

zbMATH Keywords

semiconductor manufacturingspectroscopic ellipsometrythermal chlorine etching

Mathematics Subject Classification ID

Chemistry (92E99) Adaptive control/observation systems (93C40) Application models in control theory (93C95) Other natural sciences (mathematical treatment) (92F05)

Cites Work

• Title not available (Why is that?)

Cited In (1)

• An Elementary Model for Control of a Semiconductor Etching Process

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