Modeling and simulation of thermal chlorine etching of gallium arsenide with application to real-time feedback control

DOI10.1016/S0895-7177(01)00169-8MaRDI QIDQ1609469zbMATH OpenFDO

Authors R. Smith

Publication date 15 August 2002

Published in Mathematical and Computer Modelling (Search for Journal in Brave)

zbMATH Keywords

semiconductor manufacturingspectroscopic ellipsometrythermal chlorine etching

Mathematics Subject Classification ID

Chemistry (92E99) Adaptive control/observation systems (93C40) Application models in control theory (93C95) Other natural sciences (mathematical treatment) (92F05)

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Cited in

(1)

• An Elementary Model for Control of a Semiconductor Etching Process

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