An Elementary Model for Control of a Semiconductor Etching Process

DOI10.1137/S0036144500382295MaRDI QIDQ4787270zbMATH OpenOpenAlexFDO

Authors

Publication date 5 January 2003

Published in SIAM Review (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1137/s0036144500382295

zbMATH Keywords

controlmathematical modelingsemiconductor etchingspectroscopic ellipsometry

Mathematics Subject Classification ID

General theory of mathematical modeling (00A71) Chemistry (general) in thermodynamics and heat transfer (80A50)

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(4)

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• Modeling and control of a semiconductor manufacturing process with an automata network: An example in plasma etch processing
• Microvia fill process model and control
• The Behaviour of the Etching Rate in a Model of Plasma Etching

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