Curve evolution models for real-time identification with application to plasma etching

DOI10.1109/9.739081MaRDI QIDQ4506653zbMATH OpenOpenAlexFDO

Authors Allen Tannenbaum, J. M. Berg, Anthony Yezzi

Publication date 17 October 2000

Published in IEEE Transactions on Automatic Control (Search for Journal in Brave)

Full work available at URL https://semanticscholar.org/paper/21048bda17031a6963529b97275d652ffd447dbf

zbMATH Keywords

curve evolutionidentification of free surfacesmesh refinementprocess modelingreal-time controlsemiconductor etching

Mathematics Subject Classification ID

Computer-aided design (modeling of curves and surfaces) (65D17) System identification (93B30)

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Cited in

(2)

• Shape-based optimal estimation and design of curve evolution processes with application to plasma etching
• An Elementary Model for Control of a Semiconductor Etching Process

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