Shape-based optimal estimation and design of curve evolution processes with application to plasma etching

DOI10.1109/9.975470zbMATH Open1021.93009OpenAlexW2115722082MaRDI QIDQ4540262FDOQ4540262

Authors: Nan Zhou, J. M. Berg 

Publication date: 21 July 2002

Published in: IEEE Transactions on Automatic Control (Search for Journal in Brave)

Full work available at URL: http://purl.umn.edu/3438

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zbMATH Keywords

semiconductor manufacturinglevel set methodsnonlinear partial differential equationgradient computationcurve evolution processplasma etching of thin films

Mathematics Subject Classification ID

Optimization of shapes other than minimal surfaces (49Q10) System identification (93B30) Nonlinear systems in control theory (93C10) Control/observation systems governed by partial differential equations (93C20) Application models in control theory (93C95)

Cited In (2)

• Curve evolution models for real-time identification with application to plasma etching
• Numerical analysis of an inverse problem for the eikonal equation

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