Multi-step virtual metrology for semiconductor manufacturing: a multilevel and regularization methods-based approach

DOI10.1016/J.COR.2014.05.008MaRDI QIDQ337315zbMATHOpenAlexFDO

Authors Gian Antonio Susto, Simone Pampuri, Andrea Schirru, Alessandro Beghi, Giuseppe De Nicolao

Publication date 10 November 2016

Published in Computers \& Operations Research (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1016/j.cor.2014.05.008

zbMATH Keywords

lassoridge regressionsemiconductor manufacturingstatistical modelingchemical vapor depositionetchingindustry automationlithographyregularization methodsvirtual metrology

Mathematics Subject Classification ID

Case-oriented studies in operations research (90B90) Production models (90B30)

Recommendations

• Implementing virtual metrology for in-line quality control in semiconductor manufacturing
• Virtual sensors for semiconductor manufacturing: A nonparametric approach -- exploiting information theoretic learning and kernel machines
• Multiple-input dual-output adjustment scheme for semiconductor manufacturing processes using a dynamic dual-response approach
• Advances in Neural Networks – ISNN 2005
• scientific article; zbMATH DE number 7028202

Cites work

• scientific article; zbMATH DE number 845714 (Why is no real title available?)
• Cross-Validation of Regression Models
• Generalized additive models
• Least angle regression. (With discussion)
• Linear Model Selection by Cross-Validation
• Regularization and Variable Selection Via the Elastic Net
• Ridge Regression: Biased Estimation for Nonorthogonal Problems

Cited in

(2)

• Implementing virtual metrology for in-line quality control in semiconductor manufacturing
• Time-to-event prediction with neural networks and Cox regression

This page was built for publication: Multi-step virtual metrology for semiconductor manufacturing: a multilevel and regularization methods-based approach

Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q337315)