Multi-step virtual metrology for semiconductor manufacturing: a multilevel and regularization methods-based approach

DOI10.1016/J.COR.2014.05.008zbMATH Open1348.90456OpenAlexW2507812949MaRDI QIDQ337315FDOQ337315

Authors: Gian Antonio Susto, Simone Pampuri, Andrea Schirru, Alessandro Beghi, Giuseppe De Nicolao 

Publication date: 10 November 2016

Published in: Computers \& Operations Research (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1016/j.cor.2014.05.008

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zbMATH Keywords

lassoridge regressionsemiconductor manufacturingstatistical modelingchemical vapor depositionetchingindustry automationlithographyregularization methodsvirtual metrology

Mathematics Subject Classification ID

Case-oriented studies in operations research (90B90) Production models (90B30)

Cites Work

• Least angle regression. (With discussion)
• Title not available (Why is that?)
• Regularization and Variable Selection Via the Elastic Net
• Ridge Regression: Biased Estimation for Nonorthogonal Problems
• Generalized additive models
• Linear Model Selection by Cross-Validation
• Cross-Validation of Regression Models

Cited In (2)

• Implementing virtual metrology for in-line quality control in semiconductor manufacturing
• Time-to-event prediction with neural networks and Cox regression

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