Influence of mechanical stress in a multilayer structure on spatial distribution of dopants in implanted-junction and diffusion-junction rectifiers
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Publication:3566465
Recommendations
- Influence of porosity of materials on redistribution of dopant during manufacturing of diffusion-junction rectifiers in semiconductor heterostructures
- Redistribution of dopant, implanted in a multilayer structure for production of a p-n-junction, during annealing radiative defects
- DECREASING OF SPATIAL DIMENSION OF A SERIAL OF DIFFUSED-JUNCTION RECTIFIERS IN A MULTILAYER STRUCTURE IN ACCOUNT WITH NONLINEAR EFFECTS: OPTIMIZATION OF ANNEALING TIME
- Influence of inhomogeneity and nonlinearity of multilayer structure on dopant redistribution in delta-doped area during epitaxial overgrowth
- Impurity diffusion through strained semiconductors
Cites work
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(5)- Influence of inhomogeneity and nonlinearity of multilayer structure on dopant redistribution in delta-doped area during epitaxial overgrowth
- DECREASING OF SPATIAL DIMENSION OF A SERIAL OF DIFFUSED-JUNCTION RECTIFIERS IN A MULTILAYER STRUCTURE IN ACCOUNT WITH NONLINEAR EFFECTS: OPTIMIZATION OF ANNEALING TIME
- Influence of porosity of materials on redistribution of dopant during manufacturing of diffusion-junction rectifiers in semiconductor heterostructures
- Optimization of diffusion process for production of systems of diffused-junction rectifiers
- Redistribution of dopant, implanted in a multilayer structure for production of a p-n-junction, during annealing radiative defects
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