Position Control in Lithographic Equipment [Applications of Control]

DOI10.1109/MCS.2011.941882MaRDI QIDQ5375745zbMATH OpenFDO

Authors Hans Butler

Publication date 14 September 2018

Published in IEEE Control Systems (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1109/MCS.2011.941882

Mathematics Subject Classification ID

Geometric optics (78A05) Application models in control theory (93C95)

Cited in

(12)

• Model-based vibration control for optical lenses
• Parameter space optimization towards integrated mechatronic design for uncertain systems with generalized feedback constraints
• Nonlinear current control for reluctance actuator with hysteresis compensation
• Composite jerk feedforward and disturbance observer for robust tracking of flexible systems
• Frequency-domain tools for stability analysis of reset control systems
• A constrained linear quadratic optimization algorithm toward jerk-decoupling cartridge design
• Robust control and data-driven tuning of a hybrid integrator-gain system with applications to wafer scanners
• Modeling and analysis of switching max-plus linear systems with discrete-event feedback
• Passive and active vibration isolation under isolator-structure interaction: application to vertical excitations
• Convergence performance oriented data-driven tuning method for parameterised controller design with cases investigation
• Integrated robust tracking controller design for a developed precision planar motor with equivalent disturbances
• Experimentally-efficient data-driven rational feedforward control for multivariable systems

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