Position Control in Lithographic Equipment [Applications of Control]

DOI10.1109/MCS.2011.941882zbMATH Open1395.93412MaRDI QIDQ5375745FDOQ5375745

Authors: Hans Butler 

Publication date: 14 September 2018

Published in: IEEE Control Systems (Search for Journal in Brave)

Mathematics Subject Classification ID

Application models in control theory (93C95) Geometric optics (78A05)

Cited In (9)

• Parameter space optimization towards integrated mechatronic design for uncertain systems with generalized feedback constraints
• Composite jerk feedforward and disturbance observer for robust tracking of flexible systems
• Nonlinear current control for reluctance actuator with hysteresis compensation
• Passive and active vibration isolation under isolator-structure interaction: application to vertical excitations
• Robust control and data-driven tuning of a hybrid integrator-gain system with applications to wafer scanners
• Modeling and analysis of switching max-plus linear systems with discrete-event feedback
• Frequency-domain tools for stability analysis of reset control systems
• A constrained linear quadratic optimization algorithm toward jerk-decoupling cartridge design
• Model-based vibration control for optical lenses

This page was built for publication: Position Control in Lithographic Equipment [Applications of Control]

Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q5375745)