Numerical simulation of quantum effects in high-k gate dielectric MOS structures using quantum mechanical models
From MaRDI portal
Publication:696487
DOI10.1016/S0010-4655(02)00248-5zbMath0994.82568OpenAlexW2081730103MaRDI QIDQ696487
Yiming Li, Jam-Wem Lee, Tan-Fu Lei, Tien-Sheng Chao, Ting-Wei Tang
Publication date: 12 September 2002
Published in: Computer Physics Communications (Search for Journal in Brave)
Full work available at URL: https://doi.org/10.1016/s0010-4655(02)00248-5
Related Items (2)
A parallel monotone iterative method for the numerical solution of multi-dimensional semiconductor Poisson equation ⋮ A numerical iterative method for solving Schrödinger and Poisson equations in nanoscale single, double and surrounding gate metal-oxide-semiconductor structures
Cites Work
- Error Estimates on the Approximate Finite Volume Solution of Convection Diffusion Equations with General Boundary Conditions
- A Parallel Divide and Conquer Algorithm for the Symmetric Eigenvalue Problem on Distributed Memory Architectures
- A new parallel adaptive finite volume method for the numerical simulation of semiconductor devices
- Unnamed Item
- Unnamed Item
This page was built for publication: Numerical simulation of quantum effects in high-k gate dielectric MOS structures using quantum mechanical models