Pages that link to "Item:Q5375745"

The following pages link to Position Control in Lithographic Equipment [Applications of Control] (Q5375745):

Displaying 9 items.

• A constrained linear quadratic optimization algorithm toward jerk-decoupling cartridge design (Q509520) (← links)
• Model-based vibration control for optical lenses (Q2205180) (← links)
• Parameter space optimization towards integrated mechatronic design for uncertain systems with generalized feedback constraints (Q2280681) (← links)
• Nonlinear current control for reluctance actuator with hysteresis compensation (Q2338761) (← links)
• Composite jerk feedforward and disturbance observer for robust tracking of flexible systems (Q2407195) (← links)
• Frequency-domain tools for stability analysis of reset control systems (Q2409131) (← links)
• Robust control and data‐driven tuning of a hybrid integrator‐gain system with applications to wafer scanners (Q5222723) (← links)
• Modeling and analysis of switching max-plus linear systems with discrete-event feedback (Q6080682) (← links)
• Passive and active vibration isolation under isolator-structure interaction: application to vertical excitations (Q6166456) (← links)