Cathode edge displacement by voiding coupled with grain boundary grooving in bamboo like metallic interconnects by surface drift-diffusion under the capillary and electromigration forces (Q833964): Difference between revisions

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Latest revision as of 04:36, 10 December 2024

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Cathode edge displacement by voiding coupled with grain boundary grooving in bamboo like metallic interconnects by surface drift-diffusion under the capillary and electromigration forces
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    Cathode edge displacement by voiding coupled with grain boundary grooving in bamboo like metallic interconnects by surface drift-diffusion under the capillary and electromigration forces (English)
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    14 August 2009
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    computer simulations
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    models of non-equilibrium phenomena
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    surface diffusion
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    surface morphology
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    electromigration
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    grain boundary grooving
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    cathode drift
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