A level set approach to a unified model for etching, deposition, and lithography. II: Three-dimensional simulations

DOI10.1006/JCPH.1995.1221zbMath0840.65131OpenAlexW2091510311MaRDI QIDQ1908745

James A. Sethian, David Adalsteinsson

Publication date: 30 June 1996

Published in: Journal of Computational Physics (Search for Journal in Brave)

Full work available at URL: https://doi.org/10.1006/jcph.1995.1221

zbMATH Keywords

algorithmsreflectionfinite difference methodsurface diffusionequations of motionhyperbolic conservation lawsdepositionvisibilityetchinglithographylevel set formulationHamilton-Jacobi-type equationintegrated circuit fabricationsource flux functionsthree-dimensional topography simulation

Mathematics Subject Classification ID

Probabilistic models, generic numerical methods in probability and statistics (65C20) Hyperbolic conservation laws (35L65) Finite difference methods for initial value and initial-boundary value problems involving PDEs (65M06) Applications to the sciences (65Z05) Initial value problems for linear higher-order PDEs (35G10) Higher-order parabolic equations (35K25)

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