On modelling thermal oxidation of Silicon II: numerical aspects (Q4493652)
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scientific article; zbMATH DE number 1487159
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| English | On modelling thermal oxidation of Silicon II: numerical aspects |
scientific article; zbMATH DE number 1487159 |
Statements
14 July 2002
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finite element method
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discontinuous interpolation
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oxidation of silicon
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silicon-silicon dioxide interface
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level-set method
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large expansion
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staggered scheme
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On modelling thermal oxidation of Silicon II: numerical aspects (English)
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0.9543873
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0.9301416
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0.92785877
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0.91527534
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0.9122278
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0.89763844
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