Performance assessment of run-to-run control in semiconductor manufacturing based on IMC framework

DOI10.1080/00207540802029633MaRDI QIDQ3055360zbMATH OpenOpenAlexFDO

Authors Liang Chen, Ming-Da Ma, Shi-Shang Jang, David Shan-Hill Wang, Shuqing Wang

Publication date 7 November 2010

Published in International Journal of Production Research (Search for Journal in Brave)

Full work available at URL https://doi.org/10.1080/00207540802029633

zbMATH Keywords

performance assessmentIMCbest achievable performancerun-to-run controlminimum variance performance

Mathematics Subject Classification ID

Production models (90B30)

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Cites work

• Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities.
• Good, bar or optimal? Performance assessment of multivariable processes
• Performance assessment of multivariable feedback control systems
• Performance assessment of multivariable feedback controllers

Cited in

(9)

• Run-to-run control methods based on the DHOBE algorithm
• Recursive Bayesian state estimation method for run-to-run control in high-mixed semiconductor manufacturing process
• Multiple-input dual-output adjustment scheme for semiconductor manufacturing processes using a dynamic dual-response approach
• Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities.
• Combining on-line experiment and process control methods for changes in a dynamic model
• Constructing the OGE for promoting tool group productivity in semiconductor manufacturing
• Development of Run-To-Run (R2R) controller for the multiple-input multiple-output (MIMO) system using fuzzy control theories
• A novel method for control performance assessment with fractional order signal processing and its application to semiconductor manufacturing
• Disturbance rejection run-to-run controller for semiconductor manufacturing

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