Cycle time analysis of dual-arm cluster tools for wafer fabrication processes with multiple wafer revisiting times
From MaRDI portal
(Redirected from Publication:337294)
Recommendations
- Performance evaluation of photolithography cluster tools
- Optimal K-unit cycle scheduling of two-cluster tools with residency constraints and general robot moving times
- Modelling and analysis of wafer fabrication scheduling via generalized stochastic Petri net and simulated annealing
- Reduced simulation models of wafer fabrication facilities
- A dynamic scheduling algorithm for singe-arm two-cluster tools with flexible processing times
Cites work
- A polynomial algorithm for no-wait cyclic hoist scheduling in an extended electroplating line
- A strongly polynomial algorithm for no-wait cyclic robotic flowshop scheduling
- Cyclic hoist scheduling in large real-life electroplating lines
- Real-time deadlock-free scheduling for semiconductor track systems based on colored timed Petri nets
This page was built for publication: Cycle time analysis of dual-arm cluster tools for wafer fabrication processes with multiple wafer revisiting times
Report a bug (only for logged in users!)Click here to report a bug for this page (MaRDI item Q337294)